With the increasing functional demands of micro- and nano-devices, there is a growing need for complex micro/nano-architectures featuring high spatial resolution and tunable depth profiles.

A‑Gas Electronic Materials has expanded its portfolio with the addition of mr‑P 22G, a positive‑tone grayscale photoresist ...

Nanostencil lithography (NSL) is a shadow-mask-based nanopatterning technique that allows for the direct deposition of materials through a stencil mask with nanoscale openings. It enables the ...

Continued scaling of integrated circuits to smaller dimensions is still a viable way to increase compute power, achieve higher memory cell density, or reduce power consumption. These days, chip makers ...

As DRAM technologies scale to increasingly tighter pitches, the patterning requirements exceed the limits of conventional single-exposure DUV lithography. In advanced nodes such as D1b (1-beta), ...